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Applied Wave Research Inc. (www.appwave.com) and WIN Semiconductors Corp. (www.winfoundry.com) announced the immediate availability of a process design kit (PDK) supporting WIN's power pseudomorphic high electron mobility transistor (pHEMT) gallium arsenide (GaAs) foundry process. The PDK provides monolithic microwave integrated circuit (MMIC) engineers using AWR's Microwave Office 2002 design software, with an advanced circuit simulation and layout environment for designing with WIN's 0.15-micron process. Applications for these designs range from broadband communication, optical fiber communications, automobile radar, and homeland security systems.